Laurell Technologies Corporation
11 April 2021


Back-Side Rinse

BSR Spray Head BSR and Chuck for Square Substrates

Etch, Develop, or Cleaning needs backside rinse!


The Back-Side Rinse injector, standard on all Laurell EDC systems, prevents chemical and vapor impingement from the front-side process.  An open or BSR chuck is needed to conduct the rinse effectively and is fully adjustable to accomodate most wafer sizes.

 Laurell has a long standing reputation for leading the market and the standardization on the need for BSR is one of our proudest accomplishments.