BSR

Etch, Develop, or Cleaning needs backside rinse!

The Back-Side Rinse injector, standard on all Laurell EDC systems, prevents chemical and vapor impingement from the front-side process.  An open or BSR chuck is needed to conduct the rinse effectively and is fully adjustable to accomodate most wafer sizes.

 Laurell has a long standing reputation for leading the market and the standardization on the need for BSR is one of our proudest accomplishments.